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| =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
| | The SEM Jeol has been decommissioned at Danchip and is currently waiting for new owners to take over. |
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| '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Jeol#SEM_JEOl click here]'''
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| =SEM JEOL=
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| [[image:IMG_3290.jpg|400x400px|right|thumb|Picosun R200 ALD, positioned in cleanroom F-2.]]
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| The SEM Jeol is located in the basement of DTU Danchip. I will very soon be decommissioned (within 2015) and replaced and by the SEM Supra 1 (former SEM Zeiss). | |
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| '''The user manual, control instruction, the user APV and contact information can be found in LabManager:'''
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| [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=149 SEM Jeol info page in LabManager],
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| == Performance information ==
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| *[[/SEM comparison tablel|SEM comparison table]]
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| ==Equipment performance and process related parameters==
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| {| border="2" cellspacing="0" cellpadding="2"
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
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| |style="background:WhiteSmoke; color:black"|<b>SEM Jeol (Jeol JSM 5500 LV)</b>
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| |-
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| !style="background:silver; color:black;" align="center" width="60"|Purpose
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| |style="background:LightGrey; color:black"|Imaging and measurement of
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| |style="background:WhiteSmoke; color:black"|
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| *Any samples including samples from outside the cleanroom and samples that have a thin (> ~ 5 µm) layers of non-conducting materials on top
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| |-
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| !style="background:silver; color:black;" align="center" width="60"|Location
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| |style="background:LightGrey; color:black"|
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| |style="background:WhiteSmoke; color:black"|
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| *Basement of DTU Danchip
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| !style="background:silver; color:black;" align="center" width="60"|Performance
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| |style="background:LightGrey; color:black"|Resolution
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| |style="background:WhiteSmoke; color:black"|
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| *~ 20 nm (limited by instrument)
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| The resolution is strongly dependent on the type of sample and the skills of the operator.
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Instrument specifics
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| |style="background:LightGrey; color:black"|Detectors
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| |style="background:WhiteSmoke; color:black"|
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| *Secondary electron (SEI)
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| *Backscatter electron (BEI)
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| |-
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| |style="background:LightGrey; color:black"|Stage
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| |style="background:WhiteSmoke; color:black"|
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| *X, Y: 73 × 40 mm
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| *T: -10 to 90<sup>o</sup>
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| *R: 360<sup>o</sup>
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| *Z: 38 mm
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| |-
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| |style="background:LightGrey; color:black"|Electron source
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| |style="background:WhiteSmoke; color:black"|
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| *Tungsten filament
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| |style="background:LightGrey; color:black"|Operating pressures
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| |style="background:WhiteSmoke; color:black"|
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| *Fixed at High vacuum
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| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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| |style="background:LightGrey; color:black"|Batch size
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| |style="background:WhiteSmoke; color:black"|
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| *1 100 mm wafer (not full view)
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| *Smaller samples
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| |-
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| | style="background:LightGrey; color:black"|Allowed materials
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| |style="background:WhiteSmoke; color:black"|
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| *Any standard cleanroom materials.
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| *Biological samples
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| |-
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| |}
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The SEM Jeol has been decommissioned at Danchip and is currently waiting for new owners to take over.
