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Specific Process Knowledge/Thin film deposition/Deposition of Alumina: Difference between revisions

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Jehan (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891, Bureaucrats, danchip, Administrators
1,093 edits
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*RF sputtering from Al<sub>2</sub>O<sub>3</sub> target
*RF sputtering from Al<sub>2</sub>O<sub>3</sub> target
*Reactive Sputtering
*Reactive Sputtering (never tested)
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*Reactive Sputtering
*Reactive Sputtering
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