Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual: Difference between revisions
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# Login with the following password: | # Login with the following password: | ||
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User ID | User ID Administrator | ||
Password | Password Renrum12 | ||
</pre> | </pre> | ||
Revision as of 19:50, 29 September 2015
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Purpose, location and technical specifications
The Raith Elphy system is a pattern generator built onto the LEO Scanning Electron Microscope (SEM) in cleanroom F-2. All users must therefore acquire license to use the SEM LEO before acquiring license to the Raith Elphy system.
Techical Specification
The system can be characterized as follows:
- Electron-beam scanning speeds, f, up to X MHz are available (which is maximum scan speed).
- The acceleration voltage is maximum 25 kV.
- The maximum field-size without stitching is X µm x Y µm.
- The machine has a chip holder that fits to 2 - 3 chips with sizes of approximately 1 x 1 cm2 each. A larger chip or wafer can also be mounted on a holder without a Faraday's cup.
Mounting of chips or wafers into chamber
- Ventilate the SEM chamber
- Mount your chips(s) on the Raith Specimen holder
- Mount the holder on the SEM stage, evacuate the SEM chamber
Software login
- Start the Raith ELPHY Quantum software from the desktop of the Raith computer (screen to the right).
- Login with the following password:
User ID Administrator Password Renrum12
- Start RemCon32 from the desktop on the SEM computer (screen to the left), choose 'COM 6', right-click and press 'start'