Specific Process Knowledge/Thin film deposition/Deposition of Alumina: Difference between revisions
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Revision as of 10:31, 7 September 2015
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Deposition of aluminium oxide
Aluminium oxide (Alumina, Al2O3 ) can be deposited by use of ALD (atomic layer deposition) or by a sputter technique in the Lesker Sputter System or the Cryofox PVD co-sputter/evaporation. During the sputter deposition oxygen is added to the chamber resulting in aluminium oxide on the sample
Comparison of the methods for deposition of Alumium Oxide
Sputter System Lesker | Cryofox PVD co-sputter/evaporation | ALD Picosun 200 | |
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Generel description |
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Stoichiometry |
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Film Thickness |
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Deposition rate |
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Step coverage |
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Process Temperature |
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More info on Al2O3 | |||
Substrate size |
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Allowed materials |
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