Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing/Acceptance test: Difference between revisions
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==Results== | ==Results== | ||
The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer. | The oxide thickness and the refractive index has been measured in 13 points on each wafer using the M-2000V ellipsometer. | ||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | ||
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| 2.1 | | 2.1 | ||
| 2.0 | | 2.0 | ||
|} | |||
The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer. | |||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | |||
|- | |||
! | |||
! Date | |||
! colspan="3" | Wafer 4 | |||
! colspan="3" | Wafer 16 | |||
! colspan="3" | Wafer 28 | |||
! colspan="3" | Center point only | |||
|- | |||
! width="80" | | |||
! width="80" | | |||
! width="70" | Average refractive index | |||
! width="70" | St. deviation | |||
! width="70" | Non-uniformity [%] | |||
! width="70" | Average refractive index | |||
! width="70" | St. deviation | |||
! width="70" | Non-uniformity [%] | |||
! width="70" | Average refractive index | |||
! width="70" | St. deviation | |||
! width="70" | Non-uniformity [%] | |||
! width="70" | Average refractive index | |||
! width="70" | St. deviation | |||
! width="70" | Non-uniformity [%] | |||
|- | |||
! Run 1 | |||
| 28-01-2015 | |||
| 1.46 | |||
| 0.00 | |||
| 0.04 | |||
| 1.46 | |||
| 0.00 | |||
| 0.09 | |||
| 1.46 | |||
| 0.00 | |||
| 0.06 | |||
| 1.4609 | |||
| 0.0004 | |||
| 0.0230 | |||
|- | |||
! Run 2 | |||
| 28-01-2015 | |||
| 1.46 | |||
| 0.00 | |||
| 0.09 | |||
| 1.46 | |||
| 0.00 | |||
| 0.17 | |||
| 1.46 | |||
| 0.00 | |||
| 0.05 | |||
| 1.4561 | |||
| 0.0094 | |||
| 05873 | |||
|- | |||
! Run 3 | |||
| 30-01-2015 | |||
| 1.46 | |||
| 0.00 | |||
| 0.06 | |||
| 1.44 | |||
| 0.01 | |||
| 0.69 | |||
| 1.46 | |||
| 0.00 | |||
| 0.07 | |||
| 1.4602 | |||
| 0.0004 | |||
| 0.0291 | |||
|- | |||
! Average | |||
| | |||
| 1.46 | |||
| 0.00 | |||
| 0.06 | |||
| 1.16 | |||
| 0.00 | |||
| 0.10 | |||
| 1.46 | |||
| 0.00 | |||
| 0.27 | |||
| 1.46 | |||
| 0.00 | |||
| 0.21 | |||
|} | |||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | |||
|- | |||
! colspan="3" | Run-to-run | |||
|- | |||
! width="90" | Average refractive index | |||
! width="90" | St. deviation | |||
! width="90" | Non-uniformity [%] | |||
|- | |||
| 1.4591 | |||
| 0.0026 | |||
| 0.1637 | |||
|} | |} |
Revision as of 09:29, 12 August 2015
THIS PAGE IS UNDER CONSTRUCTION
The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.
Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"
Oxidation time: 80 min
Oxidation temperature: 1050 oC (all temoperature zones)
O2 flow: 1 slm
The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.
Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured.
Results
The oxide thickness and the refractive index has been measured in 13 points on each wafer using the M-2000V ellipsometer.
Date | Wafer 4 | Wafer 16 | Wafer 28 | Center point only | |||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | ||
Run 1 | 28-01-2015 | 109.7 | 1.0 | 1.7 | 107.7 | 0.9 | 1.1 | 106.5 | 0.8 | 1.2 | 107.0 | 2.1 | 1.9 |
Run 2 | 28-01-2015 | 107.3 | 1.7 | 2.4 | 105.0 | 1.4 | 1.7 | 107.3 | 0.7 | 0.9 | 105.7 | 1.0 | 0.9 |
Run 3 | 30-01-2015 | 103.6 | 0.8 | 1.1 | 102.6 | 0.6 | 1.2 | 102.2 | 0.6 | 1.1 | 102.9 | 1.0 | 1.0 |
Average | 106.9 | 1.2 | 1.7 | 105.1 | 1.0 | 1.3 | 105.3 | 0.7 | 1.1 | 105.2 | 1.4 | 1.3 |
Run-to-run | ||
---|---|---|
Average oxide thickness [nm] | St. deviation | Non-uniformity [%] |
105.2 | 2.1 | 2.0 |
The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer.
Date | Wafer 4 | Wafer 16 | Wafer 28 | Center point only | |||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Average refractive index | St. deviation | Non-uniformity [%] | Average refractive index | St. deviation | Non-uniformity [%] | Average refractive index | St. deviation | Non-uniformity [%] | Average refractive index | St. deviation | Non-uniformity [%] | ||
Run 1 | 28-01-2015 | 1.46 | 0.00 | 0.04 | 1.46 | 0.00 | 0.09 | 1.46 | 0.00 | 0.06 | 1.4609 | 0.0004 | 0.0230 |
Run 2 | 28-01-2015 | 1.46 | 0.00 | 0.09 | 1.46 | 0.00 | 0.17 | 1.46 | 0.00 | 0.05 | 1.4561 | 0.0094 | 05873 |
Run 3 | 30-01-2015 | 1.46 | 0.00 | 0.06 | 1.44 | 0.01 | 0.69 | 1.46 | 0.00 | 0.07 | 1.4602 | 0.0004 | 0.0291 |
Average | 1.46 | 0.00 | 0.06 | 1.16 | 0.00 | 0.10 | 1.46 | 0.00 | 0.27 | 1.46 | 0.00 | 0.21 |
Run-to-run | ||
---|---|---|
Average refractive index | St. deviation | Non-uniformity [%] |
1.4591 | 0.0026 | 0.1637 |