Revision as of 09:20, 12 August 2015

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The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.

Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"

Oxidation time: 80 min

Oxidation temperature: 1050 ^oC (all temoperature zones)

O₂ flow: 1 slm

The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.

Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured.

The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer.

	Date	Wafer 4			Wafer 16			Wafer 28			Center point only
		Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]
Run 1	28-01-2015	109.7	1.0	1.7	107.7	0.9	1.1	106.5	0.8	1.2	107.0	2.1	1.9
Run 2	28-01-2015	107.3	1.7	2.4	105.0	1.4	1.7	107.3	0.7	0.9	105.7	1.0	0.9
Run 3	30-01-2015	103.6	0.8	1.1	102.6	0.6	1.2	102.2	0.6	1.1	102.9	1.0	1.0
Average		106.9	1.2	1.7	105.1	1.0	1.3	105.3	0.7	1.1	105.2	1.4	1.3

Run-to-run
Average oxide thickness [nm]	St. deviation	Non-uniformity [%]
105.2	2.1	2.0

@@ Line 106: / Line 106: @@
 | 1.4
 | 1.3
+|}
+{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
 |-
-! Common
+! colspan="3" | Run-to-run
-| colspan="23" | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
+|-
+! width="90" | Average oxide thickness [nm]
+! width="90" | St. deviation
+! width="90" | Non-uniformity [%]
+|-
+| 105.2
+| 2.1
+| 2.0
 |}