Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing/Acceptance test: Difference between revisions
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! width=" | ! width="70" | Average oxide thickness [nm] | ||
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! width=" | ! width="70" | Average oxide thickness [nm] | ||
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Revision as of 09:18, 12 August 2015
THIS PAGE IS UNDER CONSTRUCTION
The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.
Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"
Oxidation time: 80 min
Oxidation temperature: 1050 oC (all temoperature zones)
O2 flow: 1 slm
The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.
Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured.
Results
The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer.
Date | Wafer 4 | Wafer 16 | Wafer 28 | Center point only | |||||||||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | ||||||||||||
Run 1 | 28-01-2015 | 109.7 | 1.0 | 1.7 | 107.7 | 0.9 | 1.1 | 106.5 | 0.8 | 1.2 | 107.0 | 2.1 | 1.9 | ||||||||||
Run 2 | 28-01-2015 | 107.3 | 1.7 | 2.4 | 105.0 | 1.4 | 1.7 | 107.3 | 0.7 | 0.9 | 105.7 | 1.0 | 0.9 | ||||||||||
Run 3 | 30-01-2015 | 103.6 | 0.8 | 1.1 | 102.6 | 0.6 | 1.2 | 102.2 | 0.6 | 1.1 | 102.9 | 1.0 | 1.0 | ||||||||||
Average | 106.9 | 1.2 | 1.7 | 105.1 | 1.0 | 1.3 | 105.3 | 0.7 | 1.1 | 105.2 | 1.4 | 1.3 | |||||||||||
Common | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers |