Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing/Acceptance test: Difference between revisions
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Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV" | |||
Oxidation time: 80 min | |||
Oxidation temperature: 1050 <sup>o</sup>C | |||
O<sub>2</sub> flow: 1 slm | |||
The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace. | |||
Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured. | |||
The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie. | |||
Revision as of 11:50, 11 August 2015
THIS PAGE IS UNDER CONSTRUCTION
Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"
Oxidation time: 80 min Oxidation temperature: 1050 oC O2 flow: 1 slm
The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.
Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured.
The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.