Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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==Cleaning of wafers or masks== | ==Cleaning of wafers or masks== | ||
Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha" | Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha" | ||
Both 7-up and Piranha removes heavy organics | Both 7-up and Piranha removes heavy organics. | ||
Always use one of these after KOH to remove alkali ions before further processing. 7-up and Piranha are also used as cleaning solutions after stripping resist. | |||
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|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be carefull!''' | |~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be carefull!''' | ||
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|'''Process time''' | |||
|''' | |||
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10 min. | |||
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10 min. | |||
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|'''Batch size''' | |'''Batch size''' | ||
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19 | 1-19/25 4" wafers or 5 masks at a time | ||
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1-5 4" wafer at a time | 1-5 4" wafer at a time | ||