Specific Process Knowledge/Etch/Etching of Gold: Difference between revisions
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# Iodine etch: KI:I<math>_2</math>:H<math>_2</math>O - 100g:25g:500ml - standard at Danchip. Can be used with resist as mask. | # Iodine etch: KI:I<math>_2</math>:H<math>_2</math>O - 100g:25g:500ml - standard at Danchip. Can be used with resist as mask. | ||
# Aqua Regia (Kongevand): HNO<math>_3</math>:HCl - 1:3 - It is a very strong acid witch will etch most metals and are therefore used when you wish to remove all the gold from your wafer. ''' | # Aqua Regia (Kongevand): HNO<math>_3</math>:HCl - 1:3 - It is a very strong acid witch will etch most metals and are therefore used when you wish to remove all the gold from your wafer. '''you have to be very carefull when you work with Aqua Regia (Kongevand) It can generate nitrous gases witch are very toxic!!''' | ||