Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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! Chromium etch 2 | ! Chromium etch 2 | ||
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!General description | ! General description | ||
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Etch of chromium | Etch of chromium | ||
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Etch of chromium | Etch of chromium | ||
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!Chemical solution | ! Chemical solution | ||
|HNO<math>_3</math>:H<math>_2</math>O:cerisulphate - 90ml:1200ml:15g | |HNO<math>_3</math>:H<math>_2</math>O:cerisulphate - 90ml:1200ml:15g | ||
|Commercial chromium etch | |Commercial chromium etch | ||
CE 8002-A | CE 8002-A | ||
|- | |- | ||
!Process temperature | ! Process temperature | ||
|Room temperature | |Room temperature | ||
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!Possible masking materials: | ! Possible masking materials: | ||
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Photoresist (1.5 µm AZ5214E) | Photoresist (1.5 µm AZ5214E) | ||