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Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions

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|Allowed materials
|Allowed materials
|
|
*Aluminium
No restrictions
*Silicon
Make a note on the beaker of which materials have been processed.
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
|
|
*Aluminium
No restrictions
*Silicon
Make a note on the beaker of which materials have been processed.
*Silicon Oxide
*Silicon Nitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
|-
|-
|}
|}
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