Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


The ALD window for depostion of Al<sub>2</sub>O<sub>3</sub> ranges from 150 <sup>o</sup>C to 350 <sup>o</sup>C. XPS measurements shows that at temperatures below 150 <sup>o</sup>C the Al<sub>2</sub>O<sub>3</sub> will be contaminated by unreacted TMA molecules, and at temperatures above 350 <sup>o</sup>C the TMA decomposes.  
The ALD window for depostion of aluminium oxide ranges from 150 <sup>o</sup>C to 350 <sup>o</sup>C. XPS measurements shows that at temperatures below 150 <sup>o</sup>C the Al<sub>2</sub>O<sub>3</sub> will be contaminated by unreacted TMA molecules, and at temperatures above 350 <sup>o</sup>C the TMA decomposes.  


The deposition rate for Al<sub>2</sub>O<sub>3</sub> depends on the temperature, see the graph below.   
The deposition rate for Al<sub>2</sub>O<sub>3</sub> depends on the temperature, see the graph below.   
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In the graphs below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:
In the graphs below the Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles for deposition temperatures between 150 <sup>o</sup>C and 350 <sup>o</sup>C can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:


<b>Recipe name</b>: AL2O3
 
<b>Recipe</b>: AL2O3


<b>Temperature</b>: 150 <sup>o</sup>C - 350 <sup>o</sup>C
<b>Temperature</b>: 150 <sup>o</sup>C - 350 <sup>o</sup>C
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<gallery caption="Images of 80 µm thick UV defined SU8 seen from app. 30 degrees imaged with LVD detector" widths="300px" heights="300px" perrow="3">
 
image:ALD Al2O3 grow rate 150C.jpg| The LVD detector provides a large field of view and great depth of focus also at low magnification.
<gallery caption="Aluminium oxide thickness as function of number of cycles" widths="300px" heights="300px" perrow="3">
image:ALD Al2O3 grow rate 200C.jpg| Close-up of the image to the left. The resolution is great.
image:ALD Al2O3 grow rate 150C.jpg| Temperature 150 <sup>o</sup>C.
image:ALD Al2O3 grow rate 250C.jpg| Close-up of the image to the left. The resolution is excellent.
image:ALD Al2O3 grow rate 200C.jpg| Temperature 200 <sup>o</sup>C.
image:ALD Al2O3 grow rate 300C.jpg| Close-up of the image to the left. The resolution is excellent.
image:ALD Al2O3 grow rate 250C.jpg| Temperature 250 <sup>o</sup>C.
image:ALD Al2O3 grow rate 350C.jpg| Close-up of the image to the left. The resolution is excellent.
image:ALD Al2O3 grow rate 200C.jpg| Temperature 300 <sup>o</sup>C.
image:ALD Al2O3 grow rate 250C.jpg| Temperature 350 <sup>o</sup>C.
</gallery>
</gallery>


{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD Al2O3 grow rate 150C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 150 <sup>o</sup>C.]]
|}
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD Al2O3 grow rate 200C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 200 <sup>o</sup>C.]]
|}
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD Al2O3 grow rate 250C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 250 <sup>o</sup>C.]]
|}
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD Al2O3 grow rate 300C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 300 <sup>o</sup>C.]]
|}
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD Al2O3 grow rate 350C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 350 <sup>o</sup>C.]]
|}
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:ALD Al2O3 grow rate 300C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 300 <sup>o</sup>C.]]
|}


Evgeniy Shkondin, DTU Danchip, February-March 2014.
Evgeniy Shkondin, DTU Danchip, February-March 2014.

Revision as of 11:21, 27 March 2014

THIS PAGE IS UNDER CONSTRUCTION

The ALD window for depostion of aluminium oxide ranges from 150 oC to 350 oC. XPS measurements shows that at temperatures below 150 oC the Al2O3 will be contaminated by unreacted TMA molecules, and at temperatures above 350 oC the TMA decomposes.

The deposition rate for Al2O3 depends on the temperature, see the graph below.

Al2O3 thickness as function of number of cycles, temperature 150 oC.


In the graphs below the Al2O3 thickness as function of number of cycles for deposition temperatures between 150 oC and 350 oC can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:


Recipe: AL2O3

Temperature: 150 oC - 350 oC

TMA H2O
Nitrogen flow 150 sccm 200 sccm
Pulse time 0.1 s 0.1 s
Purge time 3.0 s 4.0 s


  • Aluminium oxide thickness as function of number of cycles
  • Temperature 150 oC.
    Temperature 150 oC.
  • Temperature 200 oC.
    Temperature 200 oC.
  • Temperature 250 oC.
    Temperature 250 oC.
  • Temperature 300 oC.
    Temperature 300 oC.
  • Temperature 350 oC.
    Temperature 350 oC.


Evgeniy Shkondin, DTU Danchip, February-March 2014.

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