Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD: Difference between revisions

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<gallery caption="Images of 80 µm thick UV defined SU8 seen from app. 30 degrees imaged with LVD detector" widths="300px" heights="300px" perrow="3">
image:ALD Al2O3 grow rate 150C.jpg| The LVD detector provides a large field of view and great depth of focus also at low magnification.
image:ALD Al2O3 grow rate 200C.jpg| Close-up of the image to the left. The resolution is great.
image:ALD Al2O3 grow rate 250C.jpg| Close-up of the image to the left. The resolution is excellent.
image:ALD Al2O3 grow rate 300C.jpg| Close-up of the image to the left. The resolution is excellent.
image:ALD Al2O3 grow rate 350C.jpg| Close-up of the image to the left. The resolution is excellent.
</gallery>




Revision as of 12:01, 27 March 2014

THIS PAGE IS UNDER CONSTRUCTION

The ALD window for depostion of Al2O3 ranges from 150 oC to 350 oC. XPS measurements shows that at temperatures below 150 oC the Al2O3 will be contaminated by unreacted TMA molecules, and at temperatures above 350 oC the TMA decomposes.

The deposition rate for Al2O3 depends on the temperature, see the graph below.

Al2O3 thickness as function of number of cycles, temperature 150 oC.


In the graphs below the Al2O3 thickness as function of number of cycles for deposition temperatures between 150 oC and 350 oC can be seen. From the equations the number of cycles required for a certain thickess can be calculated. The results have been obtained using the "AL2O3" recipe:

Recipe name: AL2O3

Temperature: 150 oC - 350 oC

TMA H2O
Nitrogen flow 150 sccm 200 sccm
Pulse time 0.1 s 0.1 s
Purge time 3.0 s 4.0 s
  • Images of 80 µm thick UV defined SU8 seen from app. 30 degrees imaged with LVD detector
  • The LVD detector provides a large field of view and great depth of focus also at low magnification.
    The LVD detector provides a large field of view and great depth of focus also at low magnification.
  • Close-up of the image to the left. The resolution is great.
    Close-up of the image to the left. The resolution is great.
  • Close-up of the image to the left. The resolution is excellent.
    Close-up of the image to the left. The resolution is excellent.
  • Close-up of the image to the left. The resolution is excellent.
    Close-up of the image to the left. The resolution is excellent.
  • Close-up of the image to the left. The resolution is excellent.
    Close-up of the image to the left. The resolution is excellent.



Al2O3 thickness as function of number of cycles, temperature 150 oC.


Al2O3 thickness as function of number of cycles, temperature 200 oC.


Al2O3 thickness as function of number of cycles, temperature 250 oC.


Al2O3 thickness as function of number of cycles, temperature 300 oC.


Al2O3 thickness as function of number of cycles, temperature 350 oC.


Al2O3 thickness as function of number of cycles, temperature 300 oC.

Evgeniy Shkondin, DTU Danchip, February-March 2014.

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