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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Generel description
!Generel description
|Generel description - method 1
|
*TiO2 created from a Ti sputter target. By adding oxygen during the deposition TiO2 is created.
|Generel description - method 2
|Generel description - method 2
|-
|-
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