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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
Line 93: Line 93:
!Stoichiometry
!Stoichiometry
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*A
Can probably be varied (sputter target: Ti, O2 added during deposition)
*B
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*A
*A
*B
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Line 104: Line 102:
!Film Thickness
!Film Thickness
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*A
*~10nm - ~0.5µm(>2h)
*B
*C
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*A
*Thin layers
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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