Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
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*1-25 wafers of 4" | *1-25 wafers of 4" | ||
*For other sizes ask the | *For other sizes ask the ThinFilm group | ||
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*24x2" wafers or | *24x2" wafers or | ||
*6x4" wafers or | *6x4" wafers or | ||
*6x6" wafers | *6x6" wafers | ||
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* Several small samples mounted with capton tape | |||
* 1x 50 mm wafer | |||
* 1x 100 mm wafer | |||
* 1x 150 mm wafer | |||
* 1x 200 mm wafer | |||
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Revision as of 09:53, 17 March 2014
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PolySilicon can be sputtered in Alcatel and be deposited in the PolySilicon furnace. In the chart below you can compare the two different deposition methodes:
Sputter (Alcatel) | Sputter(PVD co-sputter/evaporation) | Furnace PolySi (Furnace LPCVD pSi) | Sputter (Wordentec) | Sputter (IBE/IBSD Ionfab 300) | |
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Batch size |
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Pre-clean | RF Ar clean | RF Ar clean | RCA clean for wafers that are not fresh form the box. | RF Ar clean | . |
Layer thickness | 10Å to 1µm | 10Å to about 3000Å | ~50Å to 2µm, if thicker layers are needed please ask the furnace team. | 10Å to about 3000Å | . |
Deposition rate | 2Å/s to 15Å/s | Dependent on process parameters, but in the order of 1 Å/s. See more here |
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Dependent on process parameters, but in the order of 1 Å/s. See more here. |
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Process temperature | ? | Option: heating wafer up to 400 deg C | 560 oC (amorph) and 620 oC (poly) | ? | . |
Step coverage | Poor | . | Good | . | . |
Adhesion | Bad for pyrex, for other materials we do not know | . | Good for fused silica, silicon oxide, silicon nitride, silicon | . | . |
Allowed substrates |
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Pyrex, fused silica, silicon, metals, oxide, nitride | Fused silica, Silicon, oxide, nitride | Pyrex, fused silica, silicon, metals, oxide, nitride | . |
Allowed material |
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Doping facility | None | None | Can be doped during deposition with Boron and/or Phosphorous | None | . |
Sputtered Silicon in the Alcatel
The parameter(s) changed | New value(s) | Deposition rate |
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Standard parameters | None | |
Power | 400W | 3.8 Å/s |
Sputtered Silicon in the PVD co-sputter/evaporation
See this page: Si sputter in PVD co-sputter/evaporation
Sputtered Silicon in Wordentec
See this page: Si sputter in Wordentec