Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions
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! Comment | ! Comment | ||
| Thicknesses above | | Thicknesses above 2000 Å requires special permission | ||
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*[[/Stress Wordentec Ni films|Stress in Wordentec Ni films: study here]]. | *[[/Stress Wordentec Ni films|Stress in Wordentec Ni films: study here]]. | ||
*Thicknesses above | *Thicknesses above 2000 Å requires special permission | ||
|Only very thin layers (up to 100nm). | |Only very thin layers (up to 100nm). | ||
|Sample must be compatible with plating bath. Seed metal necessary. | |Sample must be compatible with plating bath. Seed metal necessary. | ||
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'''*''' ''To deposit layers thicker then | '''*''' ''To deposit layers thicker then 2000 Å permission is required (contact Thin film group)'' | ||