Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD: Difference between revisions
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[[Image:ALD Al2O3 grow rate 300C.jpg|300x300px|thumb|center| | [[Image:ALD Al2O3 grow rate 300C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 300 <sup>o</sup>C. Evgeniy Shkondin, DTU Danchip, February 2014.]] | ||
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[[Image:ALD Al2O3 grow rate 200C.jpg|300x300px|thumb|center| | [[Image:ALD Al2O3 grow rate 200C.jpg|300x300px|thumb|center|Al<sub>2</sub>O<sub>3</sub> thickness as function of number of cycles, temperature 300 <sup>o</sup>C. Evgeniy Shkondin, DTU Danchip, February 2014.|} | ||
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Revision as of 16:40, 19 February 2014
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[[Image:ALD Al2O3 grow rate 200C.jpg|300x300px|thumb|center|Al2O3 thickness as function of number of cycles, temperature 300 oC. Evgeniy Shkondin, DTU Danchip, February 2014.|} |
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