Specific Process Knowledge/Characterization: Difference between revisions
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== Choose topic == | == Choose topic == | ||
*[[/Sample imaging|Sample imaging]] | *[[/Sample imaging|Sample imaging]] - ''writer: Jonas'' | ||
*[[/Topographic measurement|Topographic measurement]] | *[[/Topographic measurement|Topographic measurement]] | ||
*[[/Stress measurement|Stress measurement]] | *[[/Stress measurement|Stress measurement]] | ||
*[[/Measurement of film thickness and optical constants|Measurement of film thickness and optical constants]] | *[[/Measurement of film thickness and optical constants|Measurement of film thickness and optical constants]] | ||
*[[/Wafer thickness measurement|Wafer thickness measurement]] | *[[/Wafer thickness measurement|Wafer thickness measurement]] - ''writer: Yvonne'' | ||
*[[/Element analysis|Element analysis]] | *[[/Element analysis|Element analysis]] - ''writer: Jonas'' | ||
*[[/Hydrophobicity measurement|Hydrophobicity measurement]] | *[[/Hydrophobicity measurement|Hydrophobicity measurement]] - ''writer: Jonas'' | ||
*[[/Resistivity measurement|Resistivity measurement]] | *[[/Resistivity measurement|Resistivity measurement]] - ''writer: Jan'' | ||
*[[/Other electrical measurements|Other electrical measurements]] | *[[/Other electrical measurements|Other electrical measurements]] - ''writer: Jan'' | ||
== Choose equipment == | == Choose equipment == | ||
===[[/SEM: Scanning Electron Microscopy|SEM: Scanning Electron Microscopy]]=== | ===[[/SEM: Scanning Electron Microscopy|SEM: Scanning Electron Microscopy]] - ''writer: Jonas''=== | ||
*[[/SEM: Scanning Electron Microscopy#FEI_SEM|FEI SEM]] | *[[/SEM: Scanning Electron Microscopy#FEI_SEM|FEI SEM]] | ||
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*[[/SEM: Scanning Electron Microscopy#JEOL_SEM|JEOL SEM]] | *[[/SEM: Scanning Electron Microscopy#JEOL_SEM|JEOL SEM]] | ||
===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]]=== | ===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]] - ''writer: Berit - reviewer: Flemming''=== | ||
*[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | *[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | ||
===[[/Profiler|Profiler]]=== | ===[[/Profiler|Profiler]] - ''writer: Berit''=== | ||
*[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | *[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | ||
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*[[/SIMS: Secondary Ion Mass Spectrometry#Atomika_SIMS|Atomika SIMS]] | *[[/SIMS: Secondary Ion Mass Spectrometry#Atomika_SIMS|Atomika SIMS]] | ||
===[[/Drop Shape Analyzer|Drop Shape Analyzer]]=== | ===[[/Drop Shape Analyzer|Drop Shape Analyzer]] - ''writer: Jonas''=== | ||
===[[/4-Point Probe|4-Point Probe]]=== | ===[[/4-Point Probe|4-Point Probe]] - ''writer: Jan''=== | ||
===[[/Thickness Measurer|Thickness Measurer]]=== | ===[[/Thickness Measurer|Thickness Measurer]] - ''writer: Yvonne''=== | ||
===[[/Probe station|Probe station]] - ''writer: Jan''=== | ===[[/Probe station|Probe station]] - ''writer: Jan''=== | ||
Revision as of 09:25, 7 January 2008
Choose topic
- Sample imaging - writer: Jonas
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement - writer: Yvonne
- Element analysis - writer: Jonas
- Hydrophobicity measurement - writer: Jonas
- Resistivity measurement - writer: Jan
- Other electrical measurements - writer: Jan