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Specific Process Knowledge/Thin film deposition/Wordentec: Difference between revisions

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*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]]


===Sample materials that are approved for entering the chamber===
==A rough overview of the performance of Wordentec and some process related parameters==


*Silicon
{| border="2" cellspacing="0" cellpadding="10"
*Silicon oxides
|-
*Silicon nitrides
!style="background:silver; color:black;" align="left"|Purpose
*Quartz and pyrex
|style="background:LightGrey; color:black"|Deposition of metals||style="background:WhiteSmoke; color:black"|
*Metals
*E-beam evaporation
*Sputtering
*Thermal evaporation
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
*~10Å - 1µm
|-
|style="background:silver; color:black" |.||style="background:LightGrey; color:black"|Deposition rate||style="background:WhiteSmoke; color:black"|
*~2.5Å/s - 15Å/s
|-
!style="background:silver; color:black" align="left"|Process parameter range
|style="background:LightGrey; color:black"|Process Temperature
|style="background:WhiteSmoke; color:black"|
*Approximately room temperature
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Process pressure
|style="background:WhiteSmoke; color:black"|
*~10<sup>-6</sup> - 10<sup>-5</sup> mbar
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
* 24x2" wafers or
* 6x4" wafers or
* 6x6" wafers
*Deposition on one side of the substrate
|-
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
*Silicon wafers
*Quartz wafers
*Pyrex wafers
|-
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Material allowed on the substrate
|style="background:WhiteSmoke; color:black"|
*Silicon oxide
*Silicon (oxy)nitride
*Photoresist
*Photoresist
*PMMA
*PMMA
*Mylar
*SU-8
*SU-8
*Mylar
*Any metals
|-
|}