Specific Process Knowledge/Thin film deposition/Wordentec: Difference between revisions
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*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium|Titanium (Ti)]] | ||
== | ==A rough overview of the performance of Wordentec and some process related parameters== | ||
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*Silicon | !style="background:silver; color:black;" align="left"|Purpose | ||
*Quartz | |style="background:LightGrey; color:black"|Deposition of metals||style="background:WhiteSmoke; color:black"| | ||
* | *E-beam evaporation | ||
*Sputtering | |||
*Thermal evaporation | |||
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!style="background:silver; color:black" align="left"|Performance | |||
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | |||
*~10Å - 1µm | |||
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|style="background:silver; color:black" |.||style="background:LightGrey; color:black"|Deposition rate||style="background:WhiteSmoke; color:black"| | |||
*~2.5Å/s - 15Å/s | |||
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!style="background:silver; color:black" align="left"|Process parameter range | |||
|style="background:LightGrey; color:black"|Process Temperature | |||
|style="background:WhiteSmoke; color:black"| | |||
*Approximately room temperature | |||
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Process pressure | |||
|style="background:WhiteSmoke; color:black"| | |||
*~10<sup>-6</sup> - 10<sup>-5</sup> mbar | |||
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!style="background:silver; color:black" align="left"|Substrates | |||
|style="background:LightGrey; color:black"|Batch size | |||
|style="background:WhiteSmoke; color:black"| | |||
* 24x2" wafers or | |||
* 6x4" wafers or | |||
* 6x6" wafers | |||
*Deposition on one side of the substrate | |||
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed | |||
|style="background:WhiteSmoke; color:black"| | |||
*Silicon wafers | |||
*Quartz wafers | |||
*Pyrex wafers | |||
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Material allowed on the substrate | |||
|style="background:WhiteSmoke; color:black"| | |||
*Silicon oxide | |||
*Silicon (oxy)nitride | |||
*Photoresist | *Photoresist | ||
*PMMA | *PMMA | ||
*Mylar | |||
*SU-8 | *SU-8 | ||
* | *Any metals | ||
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