Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 231: | Line 231: | ||
* trilayer flow, not tested | * trilayer flow, not tested | ||
[[http://avspublications.org/jvst/resource/1/jvstal/v19/i4/p1304_s1]] | A trilayer stack with Ge: [[http://avspublications.org/jvst/resource/1/jvstal/v19/i4/p1304_s1]] | ||
= Charge dissipating agent = | = Charge dissipating agent = | ||
* Al coating, FLOW | * Al coating, FLOW | ||
* ESPACER, no flow yet | * ESPACER, no flow yet | ||