Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
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| Deposition rate | | Deposition rate | ||
|2Å/s to 15Å/s | |2Å/s to 15Å/s | ||
|Dependent on process parameters, but in the order of 1 Å/s | |Dependent on process parameters, but in the order of 1 Å/s. See more [[Specific Process Knowledge/Thin film deposition/Si sputter in PVD co-sputter/evaporation|here]] | ||
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*undoped, boron doped:~100Å/min | *undoped, boron doped:~100Å/min | ||