Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
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=Development= | =Development= | ||
AR-P is developed in AR 600-50 and IPA is used to rinse and stop development. As we have no dedicated setup for this it must be done in beakers in the EBL development fumehood in E4. | |||
Typical development time is 60-90 seconds and it is recommended to rinse for 30 seconds in IPA. | |||
=Results= | =Results= | ||
=Dual layer for lift off= | =Dual layer for lift off= | ||