Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2: Difference between revisions
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! '''Etch rate in resist <br> (UVN)''' | ! '''Etch rate in resist <br> (UVN)''' | ||
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|<!--'''Etch rate in resist'''--> 12,5 | |<!--'''Etch rate in resist'''--> 12,5 |
Revision as of 13:15, 14 December 2023
Recipes and results - CHF3 tests
Tests performed with AZ5214E resist:
Tests performed with 915nm UVN resist + 88nm BARC:
Recipe | Recipe parameters | Duration (min) | Date | SEM picture | Etch rate in SiO2 | Etch rate in resist (UVN) |
Selectivity (SiO2:resist) |
---|---|---|---|---|---|---|---|
CHF3_t1 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 800W Platen= 30W Press= 2.5mTorr Temp= 20°C |
10:00 | |||||
CHF3_t1 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 800W Platen= 45W Press= 2.5mTorr Temp= 20°C |
10:00 | |||||
CHF3_t1 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 800W Platen= 45W Press= 2.5mTorr Temp= 0°C |
10:00 | |||||
CHF3_t2 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 150W Platen= 25W Press= 2.5mTorr Temp= 20°C |
10:00 | 23/10/23 | 27 | 12,5 | 2.1 | |
CHF3_t2 | CHF3= 22.5 sccm H2= 22.5 sccm Coil= 150W Platen= 25W Press= 2.5mTorr Temp= 20°C |
20:00 | 23/10/23 | 8.15 | 7.5 | 1.1 |