Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2: Difference between revisions
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! '''Recipe''' | ! '''Recipe''' | ||
! '''Recipe parameters''' | ! '''Recipe parameters''' | ||
! '''Process time''' | ! '''Process time (min)''' | ||
! '''Date''' | ! '''Date''' | ||
! '''SEM picture''' | ! '''SEM picture''' | ||
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|<!-- '''Recipe name''' --> CHF3_t1 | |<!-- '''Recipe name''' --> CHF3_t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 12:00 | |<!--'''Process time'''--> 12:00 | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | ||
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|<!-- '''Recipe name''' --> '''CHF3_t2''' | |<!-- '''Recipe name''' --> '''CHF3_t2''' | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> Coil= '''150W''' <br> Platen= '''25W''' <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> Coil= '''150W''' <br> Platen= '''25W''' <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 25:00 | |<!--'''Process time'''--> 25:00 | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | ||
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|<!-- '''Recipe name''' --> '''CHF3 t2''' | |<!-- '''Recipe name''' --> '''CHF3 t2''' | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> '''H<sub>2</sub>= 22.5 sccm''' <br> Coil= 150W <br> Platen= 25W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> '''H<sub>2</sub>= 22.5 sccm''' <br> Coil= 150W <br> Platen= 25W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3.t2-10H2-25min-C-01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3.t2-10H2-25min-C-01.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3_t1 | |<!-- '''Recipe name''' --> CHF3_t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> '''H<sub>2</sub>= 10''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> '''H<sub>2</sub>= 10''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 12/09/2023 | |<!--'''Date'''--> 12/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF310 H2 10min 08.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF310 H2 10min 08.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3_t1 | |<!-- '''Recipe name''' --> CHF3_t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> '''O<sub>2</sub>= 10''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> '''O<sub>2</sub>= 10''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 11/09/2023 | |<!--'''Date'''--> 11/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF310 O2 10min 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF310 O2 10min 01.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3 t1 | |<!-- '''Recipe name''' --> CHF3 t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> H<sub>2</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> H<sub>2</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 20/09/2023 | |<!--'''Date'''--> 20/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3=22.5 H2 10min C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3=22.5 H2 10min C 01.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3 t1 | |<!-- '''Recipe name''' --> CHF3 t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> H<sub>2</sub>= '''35''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> H<sub>2</sub>= '''35''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 35H2 10min C 02.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 35H2 10min C 02.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3 t1 | |<!-- '''Recipe name''' --> CHF3 t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''35''' sccm <br> H<sub>2</sub>= '''35''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''35''' sccm <br> H<sub>2</sub>= '''35''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 3535H2 10min E 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 3535H2 10min E 01.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3 t1 | |<!-- '''Recipe name''' --> CHF3 t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> '''CF<sub>4</sub>= 22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> '''CF<sub>4</sub>= 22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3.t1 22.5CF4 10min C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3.t1 22.5CF4 10min C 01.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3 t1 | |<!-- '''Recipe name''' --> CHF3 t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> H<sub>2</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> '''Press= 25mTorr''' <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> H<sub>2</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> '''Press= 25mTorr''' <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3.t122.5H2 25mT 10m C 04.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3.t122.5H2 25mT 10m C 04.png|200px]] | ||
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|<!-- '''Recipe name''' --> CHF3 t1 | |<!-- '''Recipe name''' --> CHF3 t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> H<sub>2</sub>= 22.5 sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> '''Temp= 0°C''' <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> H<sub>2</sub>= 22.5 sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> '''Temp= 0°C''' <br> | ||
|<!--'''Process time'''--> 10:00 | |<!--'''Process time'''--> 10:00 | ||
|<!--'''Date'''--> 22/09/2023 | |<!--'''Date'''--> 22/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3-22.5-H2-10min-0C-C-03.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3-22.5-H2-10min-0C-C-03.png|200px]] | ||
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! '''Recipe''' | ! '''Recipe''' | ||
! '''Recipe parameters''' | ! '''Recipe parameters''' | ||
! '''Process time''' | ! '''Process time (min)''' | ||
! '''Date''' | ! '''Date''' | ||
! '''SEM picture''' | ! '''SEM picture''' | ||
Line 184: | Line 184: | ||
|<!-- '''Recipe name''' --> CHF3_t1 | |<!-- '''Recipe name''' --> CHF3_t1 | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= '''22.5''' sccm <br> Coil= 800W <br> Platen= 15W <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 12:00 | |<!--'''Process time'''--> 12:00 | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t1 pat C 01.png|200px]] | ||
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|<!-- '''Recipe name''' --> '''CHF3_t2''' | |<!-- '''Recipe name''' --> '''CHF3_t2''' | ||
|<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> Coil= '''150W''' <br> Platen= '''25W''' <br> Press= 2.5mTorr <br> Temp= 20°C <br> | |<!-- '''SiO2 before etch''' --> CHF<sub>3</sub>= 22.5 sccm <br> Coil= '''150W''' <br> Platen= '''25W''' <br> Press= 2.5mTorr <br> Temp= 20°C <br> | ||
|<!--'''Process time'''--> 25:00 | |<!--'''Process time'''--> 25:00 | ||
|<!--'''Date'''--> 04/09/2023 | |<!--'''Date'''--> 04/09/2023 | ||
|<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] | |<!--'''SEM picture'''--> [[File:CHF3 t2 pat C 05.png|200px]] |
Revision as of 12:14, 14 December 2023
Recipes and results - CHF3 tests
Tests performed with AZ5214E resist:
Tests performed with 915nm UVN resist + 88nm BARC: