Specific Process Knowledge/Lithography/UVExposure Dose: Difference between revisions
No edit summary |
No edit summary |
||
| Line 123: | Line 123: | ||
It is important to keep in mind that this exposure time is valid only for a specific combination of exposure source and optical sensor, as well as for a specific development process. | It is important to keep in mind that this exposure time is valid only for a specific combination of exposure source and optical sensor, as well as for a specific development process. | ||
SECTION HIDDEN BY TARAN 20-03-2020 | |||
==Comparison: Relative exposure dose== | ==Comparison: Relative exposure dose== | ||
| Line 174: | Line 174: | ||
<sup>1)</sup> Due to a difference in the sensitivity of the power meter used in calibration. | <sup>1)</sup> Due to a difference in the sensitivity of the power meter used in calibration. | ||
<br clear="all" /> | <br clear="all" /> | ||
Revision as of 10:43, 23 October 2023