Specific Process Knowledge/Thin film deposition/Deposition of Niobium Titanium Nitride: Difference between revisions
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!Generel description | !Generel description | ||
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*Pulsed DC reactive sputtering | *Pulsed DC reactive sputtering | ||
*Reactive HIPIMS (high-power impulse magnetron sputtering) | *Reactive HIPIMS (high-power impulse magnetron sputtering) | ||
|*Reactive sputtering | |*Reactive DC sputtering (not tested) | ||
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Revision as of 13:32, 8 October 2023
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Deposition of Niobium Titanium Nitride
Deposition of NbTiN can be done by reactive sputtering.
The preferred tool for this application is the Cluster-based multi-chamber high vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:
Comparison of LPCVD, PECVD, and sputter systems for silicon nitride deposition
Sputter-System Metal-Nitride(PC3) | Lesker sputter system | |
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Generel description |
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*Reactive DC sputtering (not tested) |
Stoichiometry |
Tunable composition |
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Film thickness |
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Process temperature |
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Step coverage |
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Film quality |
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Batch size |
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Allowed materials |
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