Specific Process Knowledge/Thin film deposition/Deposition of Nickel: Difference between revisions

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VisualWikitext

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 !
-! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal|Temescal]])
+! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal|E-beam evaporator (Temescal)]] and [[Specific Process Knowledge/Thin film deposition/10-pocket e-beam evaporator|E-beam evaporator (10-pockets)]])
 ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]])
 ! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]])
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 ! Pre-clean
-|Ar ion bombardment
+|Ar ion etch (only in E-beam evaporator Temescal)
 |
 |RF Ar clean
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 ! Deposition rate
-|2-10 Å/s
+|1-10 Å/s
-|10-15 Å/s
+|1-10 Å/s
 |Depends on process parameters, about 1 Å/s
 |Depends on process parameters, at least ~ 4 Å/s, see conditions [[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Standard_recipe_performance|here]]
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 |
-* Silicon
+*Almost any that does not degas at your intended substrate temperature. See also the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=429 cross-contamination sheet]
-*Silicon oxide
-*Silicon (oxy)nitride
-*Photoresist
-*PMMA
-*Mylar
-*Metals
-*See also the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=429 cross-contamination sheet]
 |
-* Silicon
+Almost any that does not degas. See the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=167 cross-contamination sheet].
-* Silicon oxide
-* Silicon nitride
-* Silicon (oxy)nitride
-* Photoresist
-* PMMA
-* Mylar
-* SU-8
 |
-* Almost any that do not outgas.
+* Almost any that do not degas.
 |
-*Almost any that do not outgas. Check the cross-contamination sheet in Labmanager.
+*Almost any that does not degas at your intended substrate temperature. See cross contamination sheets for [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=441 PC1] and [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=442 PC3]
 |-