Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE/Nitride etch with DUV mask: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch)/Silicon_Nitride_Etch_using_AOE/Nitride_etch_with_DUV_mask click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/AOE_(Advanced_Oxide_Etch)/Silicon_Nitride_Etch_using_AOE/Nitride_etch_with_DUV_mask click here]''' | ||
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==Silicon nitride etch - fast - with resist mask== | ==Silicon nitride etch - fast - with resist mask== |
Revision as of 11:59, 3 February 2023
Feedback to this page: click here This page is written by Berit Herstrøm @ DTU Nanolab (BGHE) if nothing else is stated