Specific Process Knowledge/Thin film deposition/Deposition of Germanium: Difference between revisions
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''All text by DTU Nanolab staff'' | |||
== Deposition of Germanium == | == Deposition of Germanium == | ||
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! | ! | ||
! Thermal evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ! Thermal evaporation ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ||
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal|Temescal]]) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal|Temescal]]) | ||
! Sputtering ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]]) | ! Sputtering ([[Specific Process Knowledge/Thin film deposition/Lesker|Lesker]]) | ||
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! General description | ! General description | ||
|Thermal deposition of Ge | |Thermal deposition of Ge | ||
|E-beam deposition of Ge | |E-beam deposition of Ge | ||
|Sputter deposition of Ge | |Sputter deposition of Ge | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
! Pre-clean | ! Pre-clean | ||
|- | |||
| - | |||
|Ar ion beam clean | |Ar ion beam clean | ||
|RF Ar clean | |RF Ar clean | ||
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! Layer thickness | ! Layer thickness | ||
|10Å to about 2000Å (in total distributed on all loaded wafers) | |10Å to about 2000Å (in total distributed on all loaded wafers) | ||
|10Å to about 1000 nm | |10Å to about 1000 nm | ||
|10Å to at least 1000 Å | |10Å to at least 1000 Å | ||
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! Deposition rate | ! Deposition rate | ||
|From 0.4 Å/s up to about ~2Å/s | |From 0.4 Å/s up to about ~2Å/s | ||
|From 1 Å/s up to 5 Å/s | |From 1 Å/s up to 5 Å/s | ||
|Depends on deposition parameters | |Depends on deposition parameters | ||
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*6x 6" wafers or | *6x 6" wafers or | ||
Many small pieces | Many small pieces | ||
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*Up to 4 x 6" wafer or | *Up to 4 x 6" wafer or | ||
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! Allowed substrates | ! Allowed substrates | ||
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* | *Almost any that does not degas. See also the cross-contamination sheet | ||
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* | *Almost any that does not degas. See also the cross-contamination sheet | ||
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* SU-8 | * SU-8 | ||
* Metals | * Metals | ||
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*Silicon oxide | *Silicon oxide | ||
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! Comment | ! Comment | ||
|Recommended for unexposed e-beam resist | |Recommended for unexposed e-beam resist | ||
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|} | |} | ||