Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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|'''Chemical solution''' | |'''Chemical solution''' | ||
|98% Sulfuric acid and Ammonium sulfate | |98% Sulfuric acid and Ammonium sulfate | ||
|98% Sulfuric acid and Hydrogen peroxide 4:1 add H< | |98% Sulfuric acid and Hydrogen peroxide 4:1 add H<sub>2</sub>O<sub>2</sub> to H<sub>2</sub>SO<sub>4</sub> | ||
|- | |- | ||
|'''Process temperature''' | |'''Process temperature''' | ||