Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of AZO: Difference between revisions

← Older editNewer edit →
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
added new sputter equipment
Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
No edit summary
Line 50: Line 50:
|
|
*Many smaller samples  
*Many smaller samples  
*Up to 10x4" or 6" wafers
*Up to 10x4" or 6" wafers (Cassette load in the LL)
|
|
*Pieces or  
*Pieces or  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_AZO"