Template:SEM comparison table 314: Difference between revisions
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! Equipment | ! Equipment | ||
<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S|SEM Inspect S]] --> | <!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S|SEM Inspect S]] --> | ||
![[ | ![[LabAdviser/314/SEM/Nova|Nova]] | ||
![[ | ![[LabAdviser/314/SEM/QFEG|QFEG]] | ||
![[LabAdviser/314/SEM/AFEG|AFEG]] | |||
![[ | ![[LabAdviser/314/FIB/Helios|Helios]] | ||
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*Cryogenic sample fixing/stabilization using cryo stage | *Cryogenic sample fixing/stabilization using cryo stage | ||
*X Ray Analysis with EDS | *X Ray Analysis with EDS | ||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
*Charge reduction in Low Vac | *Charge reduction in Low Vac | ||
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*Conductive samples in High Vac | *Conductive samples in High Vac | ||
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!Equipment position | !Equipment position | ||
<!-- |CEN Building 314 --> | <!-- |CEN Building 314 --> | ||
| | |Building 314 Room 060 | ||
| | |Building 314 Room 011 | ||
|Building 314 Room 034 | |||
| | |Building 314 Room 061 | ||
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* Extended vacuum mode (ESEM) | * Extended vacuum mode (ESEM) | ||
•1.4 nm at 30 kV (SE) | •1.4 nm at 30 kV (SE) | ||
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* | * High vacuum | ||
• 0.8 nm at 30 kV (STEM) | |||
* | • 1.0 nm at 30 kV (SE) | ||
• 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE) | |||
*High vacuum with beam deceleration option | |||
• 3.0 nm at 1 kV (BD mode + BSE) | |||
* Low vacuum - 1.4 nm at 30 kV (SE) | |||
•2.5 nm at 30 kV (BSE) | |||
•3.0 nm at 3 kV (SE) | |||
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* Electron Column | * Electron Column | ||
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*EDS X Ray by energy | *EDS X Ray by energy | ||
*STEM Scanning Transmission Electron Microscopy | *STEM Scanning Transmission Electron Microscopy | ||
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*ETD Secondary Electrons | *ETD Secondary Electrons | ||
*BSED Back Scatter Electrons | *BSED Back Scatter Electrons | ||
*LVD/LFD Low Vac SE | *LVD/LFD Low Vac SE | ||
*GSED ESEM SE | |||
*EDS X Ray by energy | |||
*STEM Scanning Transmission Electron Microscopy | *STEM Scanning Transmission Electron Microscopy | ||
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*ETD/TLD Secondary Electrons | *ETD/TLD Secondary Electrons | ||
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* R 360⁰ | * R 360⁰ | ||
* T 70⁰ Manual | * T 70⁰ Manual | ||
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* X | * X 50mm | ||
* Y | * Y 50mm | ||
* Z 50mm | * Z 50mm | ||
* R 360⁰ | * R 360⁰ | ||
* T 70⁰ | * T 70⁰ Manua | ||
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* X 150mm Piezo | * X 150mm Piezo | ||
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| B | | B | ||
| C | | C | ||
| D | |||
| E | | E | ||
|- | |- |
Revision as of 11:27, 24 March 2020
Equipment | Nova | QFEG | AFEG | Helios | |
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Purpose |
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Equipment position | Building 314 Room 060 | Building 314 Room 011 | Building 314 Room 034 | Building 314 Room 061 | |
Resolution | The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon | ||||
B |
• 0.8 nm at 30 kV (STEM) • 1.0 nm at 30 kV (SE) • 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
• 3.0 nm at 1 kV (BD mode + BSE)
•2.5 nm at 30 kV (BSE) •3.0 nm at 3 kV (SE)
•1.4 nm at 30 kV (SE) |
• 0.8 nm at 30 kV (STEM) • 1.0 nm at 30 kV (SE) • 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
• 3.0 nm at 1 kV (BD mode + BSE)
•2.5 nm at 30 kV (BSE) •3.0 nm at 3 kV (SE) |
•0.8nm @15kV •0.9nm @1kV
•4.5nm @ 30kV | ||
Detectors |
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Stage specifications |
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Options | B | C | D | E | |
Max sample size | Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size |