Specific Process Knowledge/Lithography/4562: Difference between revisions

← Older edit Newer edit →

VisualWikitext

Revision as of 10:42, 24 July 2019

Feedback to this section: click here

AZ 4562 is a positive UV photoresist for thick coatings (5µm and above).

Priming

Spin coating

Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)

Exposure

Development

The recommended development speed for AZ 4562 is 2µm/min. A 6.2µm resist film thus requires 3min development, usually as three 60s puddles of TMAH (AZ 726 MIF). 10µm AZ 4562 has successfully been developed using 4x60s development

Revision as of 10:16, 24 July 2019 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,287 edits →‎Spin coating ← Older edit		Revision as of 10:42, 24 July 2019 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,287 edits →‎Development Newer edit →
Line 15:		Line 15:
	==Development==		==Development==

	The recommended development speed for AZ 4562 is 2µm/min. A		The recommended development speed for AZ 4562 is 2µm/min. A 6.2µm resist film thus requires 3min development, usually as three 60s puddles of TMAH (AZ 726 MIF). 10µm AZ 4562 has successfully been developed using 4x60s development