Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 173: | Line 173: | ||
|Pneumatic | |Pneumatic | ||
autofocus | autofocus | ||
| -3. | | -3.1 mRad | ||
| ±1.4 mRad | | ±1.4 mRad | ||
±0.08° | ±0.08° | ||
| Line 173: | Line 173: | ||
|Pneumatic | |Pneumatic | ||
autofocus | autofocus | ||
| -3. | | -3.1 mRad | ||
| ±1.4 mRad | | ±1.4 mRad | ||
±0.08° | ±0.08° | ||