Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions

Revision as of 11:11, 5 November 2018 view source Reet (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 1,760 edits →Thermal deposition of Aluminium ← Older edit		Revision as of 11:12, 5 November 2018 view source Reet (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 1,760 edits →Comparison of roughness and other surface characteristics for different methods of Aluminium deposition Newer edit →
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	==Comparison of roughness and other surface characteristics for different methods of Aluminium deposition==		==Comparison of roughness and other surface characteristics for different methods of Aluminium deposition==

	~~Studies~~ by AFM was performed to examine ~~differences in characteristics of~~ the Al films, deposited with ~~the differnt methods (sputter, e-beam,~~ thermal). See details of the study [[/Comparison of roughness and other surface characteristics for different methods of Aluminium deposition\|here]].		A study by AFM was performed to examine the Al films deposited with thermal evaporation. See details of the study [[/Comparison of roughness and other surface characteristics for different methods of Aluminium deposition\|here]].