Specific Process Knowledge/Characterization/XPS/XPS Depth profiling: Difference between revisions
Appearance
| Line 10: | Line 10: | ||
As an example, to the left is shown a depth profile of a sample | As an example, to the left is shown a depth profile of a sample | ||
[[File:profile sandwich 3.PNG|400px]] | |||
As an illustration, a figure to the left, shows an elemental analysis through a metallic film consisting of Ni and Cr. The metallic layer was about 70 nm thick, and the atomic percentage of Ni and Cr was measured through the layer. | As an illustration, a figure to the left, shows an elemental analysis through a metallic film consisting of Ni and Cr. The metallic layer was about 70 nm thick, and the atomic percentage of Ni and Cr was measured through the layer. | ||
In the graph, you see the atomic % as a function of etch depth, and it is possible to detect that the relationship between Ni and Cr is fairly constant through the metallic film. | In the graph, you see the atomic % as a function of etch depth, and it is possible to detect that the relationship between Ni and Cr is fairly constant through the metallic film. | ||