Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

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[[image:Nanoman.jpg|290x290px|right|thumb|Nanoman: positioned in cleanroom 4 - glass cage no. 4]]
[[image:Nanoman.jpg|290x290px|right|thumb|Nanoman: positioned in cleanroom 4 - glass cage no. 4]]


The AFM: Nanoman is a product of Veeco Instruments. AFM stands for Atomic Force Microscope which is a scanning probe microscope where a sharp probe is scanned across a surface either in contact mode or tapping mode. The outcome is a topographic plot of the surface. It has a lateral solution of about 1 nm and a vertical resolution of less than 1 Å which makes it very suitable for topographic characterization in the nanometer regime. The limiting factor however is often the size of the probe in use. The tip radius of curvature (ROC) can be from 2 nm up to more than 20 nm depending on the chosen probe. The half cone angle of the tip can vary from less than 3<sup>o</sup> to over 25<sup>o</sup> giving problems resolving high aspect ratio structures.  
The AFM: Nanoman is a product of Bruker. AFM stands for Atomic Force Microscope which is a scanning probe microscope where a sharp probe is scanned across a surface either in contact mode or tapping mode. The outcome is a topographic plot of the surface. It has a lateral solution of about 1 nm and a vertical resolution of less than 1 Å which makes it very suitable for topographic characterization in the nanometer regime. The limiting factor however is often the size of the probe in use. The tip radius of curvature (ROC) can be from 2 nm up to more than 20 nm depending on the chosen probe. The half cone angle of the tip can vary from less than 3<sup>o</sup> to over 25<sup>o</sup> giving problems resolving high aspect ratio structures.  


The main purposes are surface roughness measurements and step/structure high measurements in the nanometer and sub-micrometer regime. For larger structure see the [[Specific Process Knowledge/Characterization/Topographic measurement|topografic measurement]] page.  
The main purposes are surface roughness measurements and step/structure high measurements in the nanometer and sub-micrometer regime. For larger structure see the [[Specific Process Knowledge/Characterization/Topographic measurement|topografic measurement]] page.  


To get some product information from the vendor take a look at Veeco's homepage [http://www.veeco.com/products/details.php?cat=1&sub=1&pid=178]  
To get some product information from the vendor take a look at Bruker's homepage [http://www.bruker-axs.com/atomicforcemicroscopy.html] (Bruker acquired Veeco's AFM business in Oct. 2010)
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Revision as of 13:58, 10 December 2010

Nanoman

Nanoman: positioned in cleanroom 4 - glass cage no. 4

The AFM: Nanoman is a product of Bruker. AFM stands for Atomic Force Microscope which is a scanning probe microscope where a sharp probe is scanned across a surface either in contact mode or tapping mode. The outcome is a topographic plot of the surface. It has a lateral solution of about 1 nm and a vertical resolution of less than 1 Å which makes it very suitable for topographic characterization in the nanometer regime. The limiting factor however is often the size of the probe in use. The tip radius of curvature (ROC) can be from 2 nm up to more than 20 nm depending on the chosen probe. The half cone angle of the tip can vary from less than 3o to over 25o giving problems resolving high aspect ratio structures.

The main purposes are surface roughness measurements and step/structure high measurements in the nanometer and sub-micrometer regime. For larger structure see the topografic measurement page.

To get some product information from the vendor take a look at Bruker's homepage [1] (Bruker acquired Veeco's AFM business in Oct. 2010)

An overview of the performance of the AFM: Nanoman

Purpose Topografic measurement in the nanometer and and sub-micrometer regime
  • Surface roughness measurement
  • Step/structure hight measurement
  • Surface image
Performance Scan range xy Up to 90 µm square
Scan range z 1 µm (can go up to 6µm with special settings)
Resolution xy Down to 1.4 nm - accuracy better than 2%
Resolution z <1 Å - accuracy better than 2%
Max. scan depth as a function of trench width W ~1 for our standard probe. Can be improved to about 10 with the right probe
Hardware settings Tip radius of curvature Standrad probe: <12 nm
Substrates Substrate size Up to 6"
Substrate material allowed In principle all materials