Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
| Line 7: | Line 7: | ||
==Defocus== | ==Defocus== | ||
The optimal defocus setting is probable a function of the resist thickness, but for 1.5µm resist, a defocus of -4 seems to be optimal. | |||
=Substrate positionning= | =Substrate positionning= | ||