Specific Process Knowledge/Thin film deposition/Deposition of AZO: Difference between revisions
| Line 28: | Line 28: | ||
! Layer thickness | ! Layer thickness | ||
|10Å to 5000Å* | |10Å to 5000Å* | ||
| | |0 to 1000 Å | ||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
! Deposition rate | ! Deposition rate | ||
|Depending on process parameters. | |Depending on process parameters. | ||
| | |Depending on temperature | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Line 42: | Line 42: | ||
*1x6" wafer | *1x6" wafer | ||
| | | | ||
* | *Pieces or | ||
* | *1x4" wafer or | ||
* | *1x6" wafer or | ||
*1x8" wafer | |||
|- | |- | ||