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Specific Process Knowledge/Thin film deposition/Deposition of AZO: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Deposition rate
! Deposition rate
|2Å/s to 15Å/s
|Depending on process parameters.
|
|
|-
|-
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! Batch size
! Batch size
|
|
*Up to 1x4" wafers
*Pieces or
*smaller pieces
*1x4" wafer or
*1x6" wafer
|
|
*Pieces or
*
*1x4" wafer or
*
*1x6" wafer
*
|-
|-


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|
|
* Silicon  
* Silicon
* Silicon oxide  
* Silicon oxide  
* Silicon nitride
* Silicon (oxy)nitride  
* Silicon (oxy)nitride  
* Photoresist  
* Photoresist  
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* SU-8  
* SU-8  
* Metals  
* Metals  
* Carbon
|
|
* Silicon
* Silicon
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