Revision as of 16:05, 3 April 2008

The Molecular Vapor Deposition Tool

The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is essential for nanoimprint lithography.

Processing on the MVD

The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals typically have a teflon-like tail consisting of -(CF₂)_xCF₃ and, in the other end, a reactive group -Si(Cl_x)_3-x.

In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.

Some chemicals of the MVD and the surface reaction
Different chemicals for the MVD.
The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl.

The flat recipe
O₂ plasma	Flow	200 sccm
	Power	250 Watts
	Time	300 seconds
Chemical # 1 (vapor order 1)	Name	FDTS
	Line no.	3
	Cycles	4
	Pressure	0.500 Torr
Chemical # 2 (vapor order 2)	Name	Water
	Line no.	1
	Cycles	1
	Pressure	18 Torr
Processing	Time	900 seconds
Purge	Cycles	5

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 [[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom 1]]
-The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
+The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is essential for nanoimprint lithography.
+== Processing on the MVD ==
+The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals typically have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si(Cl<sub>x</sub>)<sub>3-x</sub>.
+In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
 <gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="2">