Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
New page: =The Molecular Vapor Deposition Tool = The MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprin... |
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=The Molecular Vapor Deposition Tool = | =The Molecular Vapor Deposition Tool = | ||
[[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom 1]] | |||
The MVD 100 system deposits molecular films on surfaces. These films serve a wide range | The MVD 100 system deposits molecular films on surfaces. These films serve a wide range | ||
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MEMS structures. They are created as self-assembled monolayers on a surface when a molecular | MEMS structures. They are created as self-assembled monolayers on a surface when a molecular | ||
vapor of chemials is present. In the case of FDTS the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | vapor of chemials is present. In the case of FDTS the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | ||
Revision as of 14:38, 2 April 2008
The Molecular Vapor Deposition Tool
The MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In the case of FDTS the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.