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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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{| border="2" cellspacing="2" cellpadding="3" align="center" style="width:750px"
! colspan="5" |Deposition conditions at 150 <sup>o</sup>C
|-
!Number of cycles
|<b>Thickness (nm)</b>
|<b>Uniformity across 100mm Si substrate (%)</b>
|<b>Standard deviation error</b>
|<b>Refractive index @ 632.8 nm</b>


|-
|150
|15.38
|1.72
|0.18
|1.61
|-
|300
|28.67
|1.73
|0.36
|1.62
|-
|500
|46.93
|1.75
|0.57
|1.62
|-
|800
|73.46
|1.75
|0.92
|1.63
|-
|1088
|99.50
|1.74
|1.20
|1.63
|-
|}
|-
|-
|}
|}