Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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Recipe: Al2O3LT
Recipe: Al2O3LT


Temperature:80-150C
Temperature:80-150 <sup>o</sup>C


==Low temperature deposition of TiO<sub>2</sub>==
==Low temperature deposition of TiO<sub>2</sub>==

Revision as of 14:18, 19 May 2016

This page describes non standart recipes including multilayers structures.

Low temperature deposition of Al2O3

Recipe: Al2O3LT

Temperature:80-150 oC

Low temperature deposition of TiO2

Recipe: TiO2LT

Temperature: 80-150C

Low temperature grown multilayers on flat surfaces

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120C

Al2O3/TiO2 multilayers on high aspect ratio structures

Recipe: Multi T

Temperature: 150C