Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
| Line 5: | Line 5: | ||
Recipe: Al2O3LT | Recipe: Al2O3LT | ||
Temperature:80- | Temperature:80-150 <sup>o</sup>C | ||
==Low temperature deposition of TiO<sub>2</sub>== | ==Low temperature deposition of TiO<sub>2</sub>== | ||