Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask/Striation: Difference between revisions
< Specific Process Knowledge | Etch | Etching of Silicon Oxide | SiO2 etch using AOE | Standard recipe with resist mask
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</gallery> | </gallery> | ||
<gallery> | |||
Image:AZ1_3 after autoconfig.jpg | |||
Image:MIR1_2.jpg | |||
Image:nLof1_1.jpg | |||
</gallery> | |||
==Roughness of the resist after etch measured with the AFM== | ==Roughness of the resist after etch measured with the AFM== | ||
Revision as of 12:00, 25 November 2015
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Striation: Side wall roughness
- Striation with different resists used
Az resist
Az resist
Az resist
Az resist - profile after etch
Mir resist
Mir resist
Mir resist
Mir resist - profile after etch
nLof
nLof
nLof
nLof resist - profile after etch
