Specific Process Knowledge/Characterization/SEM Jeol

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SEM JEOL

Picosun R200 ALD, positioned in cleanroom F-2.

The SEM Jeol is located in the basement of DTU Danchip. I will very soon be decommissioned (within 2015) and replaced and by the SEM Supra 1 (former SEM Zeiss).

The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Jeol info page in LabManager,

Performance information

• SEM comparison table

Equipment performance and process related parameters

Equipment		SEM Jeol (Jeol JSM 5500 LV)
Purpose	Imaging and measurement of	Any samples including samples from outside the cleanroom and samples that have a thin (> ~ 5 µm) layers of non-conducting materials on top
Location		Basement of DTU Danchip
Performance	Resolution	~ 20 nm (limited by instrument) The resolution is strongly dependent on the type of sample and the skills of the operator.
Instrument specifics	Detectors	Secondary electron (SEI) Backscatter electron (BEI)
	Stage	X, Y: 73 × 40 mm T: -10 to 90o R: 360o Z: 38 mm
	Electron source	Tungsten filament
	Operating pressures	Fixed at High vacuum
Substrates	Batch size	1 100 mm wafer (not full view) Smaller samples
	Allowed materials	Any standard cleanroom materials. Biological samples