Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE/Nitride etch with DUV mask: Difference between revisions

Revision as of 13:54, 16 October 2015

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Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015
Profile of lines with 1µm pitch
Profile of lines with 4µm pitch
Profile of 2µm line - zoom in on 4µm pitch

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	~~=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]=~~

	<gallery caption="Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015 " widths="300px" heights="250px" perrow="3">		<gallery caption="Etch of LPCVD nitride with DUV KRF resist as mask. The mask is still on. Made by BGHE February 2015 " widths="300px" heights="250px" perrow="3">