Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual: Difference between revisions
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*The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below. | *The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below. | ||
= Mounting of chips or wafers into | = Mounting of chips or wafers into chamber = | ||
Revision as of 12:09, 28 September 2015
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Purpose, location and technical specifications
The Raith Elphy system is a pattern generator built onto the LEO Scanning Electron Microscope (SEM). All users must therefore acquire license to use the SEM LEO before acquiring license to use the Raith Elphy system.
Location
Techical Specification
The system can be characterized as follows:
- The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system, see illustration below.